Edwards A419-61-222 High Vacuum Dry Pump

Edwards A419-61-222 High Vacuum Dry Pump 

 Introduction

Edwards A419-61-222 is a high vacuum dry pump from Edwards, with an oil-free structure. It is commonly used for pre vacuum in semiconductor equipment, ensuring stability and resistance to contamination.

1. Fully dry oil-free design, no oil reflux pollution will occur in the process chamber

2. Internal non-contact rotor, with minimal wear and reliable continuous long-term operation

3. It comes with anti-corrosion treatment and can withstand a small amount of corrosive gases in the process

4. The overall vibration and noise of the machine are low, making it easy to integrate into the interior of the machine

5. Comes with a status monitoring interface for easy access to device control systems

6. The ultimate vacuum can reach 0.001 mbar

7. Rated pumping speed 110 m ³/h

8. Power supply 380V three-phase, rated power 4.2kW

9. Working temperature range: 10-45 ℃

10. Inlet interface KF40

11. Pre stage vacuum extraction of semiconductor etching equipment

12. Pre evacuated chamber of thin film deposition equipment

13. Load lock chamber rapid pressure relief and air extraction

14. Front stage unit of vacuum coating equipment

15. Pre stage pump of high vacuum system for analytical instruments

This A419-61-222 dry pump is very practical in semiconductor vacuum processes, with corrosion resistance and no oil pollution. It is a standard pre vacuum source for many process equipment.

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