TEL Tokyo Electron 3S80-00007-11 Turbocharging Pump

TEL Tokyo Electron 3S80-00007-11 Turbocharging Pump

Product Details Introduction

Tokyo Electron (TEL) 3S80-00007-11 Turbocharging Pump - Product Application Field Detailed Explanation

1、 Product functional positioning

The 3S80-00007-11 Turbo Molecular Pump (TMP) is one of the core components used to maintain a vacuum environment in Tokyo Electron semiconductor equipment. It is usually used in medium to high vacuum sections, with a high-speed rotating impeller structure, suitable for vacuum processes that require extremely high cleanliness and stability.

2、 Main application areas

1. Vacuum system of semiconductor vacuum processing equipment

Core function: To provide a medium to high vacuum environment for wafer processing chambers (such as etching chambers, CVD chambers, PVD chambers, etc.);

Target vacuum range: 10 ⁻³ Pa to 10 ⁻⁶ Pa;

Typical equipment:

Plasma etching equipment (Etcher)

Atomic Layer Deposition (ALD) System

Chemical Vapor Deposition (CVD)

Metal Organic Chemical Vapor Deposition (MOCVD)

2. Maintenance of High Cleanliness Process Environment

Oil free structure: The turbo molecular pump does not use lubricating oil, eliminating oil pollution and suitable for ultra clean environments;

Low vibration/low noise: suitable for sensitive process operations such as thin film deposition, ion implantation, vacuum annealing, etc;

Reaction control: provides a stable vacuum foundation for high-precision temperature control and airflow control.

Product imag

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