TEL 2L80-004142-11 RF Filter Component

TEL 2L80-004142-11 RF Filter Component 

 Introduction

TEL 2L80-004142-11 RF Filter Component

Product Features:

1. Accurately filter out harmonic clutter in RF circuits and reduce the impact of interference signals on plasma processes

2. Metal shielding shell can maintain stable filtering effect even in strong electromagnetic environment of the cavity

3. Built in high-voltage RF circuit, capable of withstanding high-frequency power impact of plasma equipment for a long time

4. Standardized joint structure, easy on-site disassembly and replacement, no need to modify the original RF wiring

5. Original factory aging screening, adapted to TEL etching long-term continuous production conditions

Product Parameters:

1. Material model: 2L80-004142-11

2. Applicable RF frequency band: 13.56MHz

3. Power tolerance: matching the standard RF power of the machine

4. Interface type: RF coaxial interface

5. Compatible equipment: TEL semiconductor etching process machine

Application fields:

1. Semiconductor dry etching RF circuit clutter filtering

2. RF signal purification using plasma thin film process

3. Noise suppression of RF power supply in wafer etching chamber

4. Rear end harmonic filtering of RF matching device

5. Replacement and maintenance of RF spare parts for TEL machines

This TEL 2L80-004142-11 RF filter component is a key passive spare part in the RF circuit of the etching machine, which filters RF noise, ensures uniform and stable plasma process, and can be quickly replaced on the machine by checking the model.

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