MKS 1044718-001 Controller Module

MKS 1044718-001 Controller Module 

 Introduction

MKS 1044718-001 Controller Module

Product Features:

1. Adopting PID closed-loop control algorithm to quickly adjust chamber pressure, maintain stable process pressure, and respond quickly

2. Built in signal isolation processing circuit to resist electromagnetic interference from plasma chambers and accurately collect pressure data

3. Integrated fault self checking function, real-time monitoring of sensor and valve status, and outputting alarm signals in case of abnormalities

4. Metal reinforced shell, resistant to dust and process trace corrosion, suitable for long-term continuous operation of semiconductor production lines

5. Rack mounted standardized interface, easy to plug and replace on-site, and the original circuit does not require large-scale modifications

Product Parameters:

1. Material model: 1044718-001

2. Control type: Vacuum pressure closed-loop control module

3. Working power supply: DC24V

4. Signal interface: analog+digital communication interface

5. Compatible equipment: semiconductor etching, deposition process vacuum chamber

Application fields:

Real time control of vacuum pressure in semiconductor etching chamber

2. Pressure control of CVD/PVD thin film deposition chamber process

3. Pressure sensor signal acquisition and valve drive control

4. Abnormal monitoring and protection of wafer process chamber pressure

5. Replacement and maintenance of spare parts for MKS vacuum control system controller

This MKS 1044718-001 controller module is the core unit of vacuum pressure control, which is linked with pressure gauges and regulating valves to stabilize the chamber process pressure and ensure the repeatability of thin film and etching processes

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