LAM 27-382473-00 RF Matcher

LAM 27-382473-00 RF Matcher 

 Introduction

LAM 27-382473-00 RF Matcher

Product Features:

1. Fast dynamic impedance adjustment, real-time compensation for plasma load fluctuations in the etching chamber, and low RF reflection power

2. Built in power protection mechanism, automatically cuts off the output when the load is abnormal, preventing damage to the RF power supply

3. All metal shielded cavity, resistant to strong electromagnetic interference, stable operation under long-term continuous production conditions

4. Equipped with status feedback communication, it can transmit real-time matching position, power, and fault information to the upper computer

5. Integrated structure, easy on-site disassembly and replacement, no need to modify the original RF circuit

Product Parameters:

1. Material model: 27-382473-00

2. Operating frequency: 13.56MHz

3. Rated RF power: 2500W

4. Control power supply: 24V DC

5. Compatible equipment: LAM semiconductor etching machine

Application fields:

1. Automatic matching of RF impedance in semiconductor dry etching chamber

2. Efficient transmission and control of RF energy in plasma technology

3. RF reflection power suppression in wafer etching process

4. Load matching and process stability guarantee for RF power supply matching

5. Replacement and maintenance of spare parts for LAM etching equipment RF system

This LAM 27-382473-00 RF matching device is the core component of the RF circuit in etching equipment, which continuously and stably completes impedance matching to ensure plasma process consistency. By checking the model, it can be quickly replaced on the machine.

Product imag

ontroller Module

DS200SDCIG1ABA Gas turbine module
DS215DMCBG1AZZ03A Gas turbine card
DS200DMCBG1AED DS200DMCBG1AKG module

Other website links

3BHB045647R0003 励磁可控硅模块
PM865K02 CPU模块
PFCL201C 20KN 压力传感器模块