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  • Agilent EX9698811 Turbomolecular Pump
  • Agilent EX9698811 Turbomolecular Pump
  • Agilent EX9698811 Turbomolecular Pump
Agilent EX9698811 Turbomolecular Pump Agilent EX9698811 Turbomolecular Pump Agilent EX9698811 Turbomolecular Pump

Agilent EX9698811 Turbomolecular Pump

Agilent EX9698811 Turbomolecular Pump 

 Introduction

Agilent EX9698811 Turbomolecular Pump

Product Features:

1. Suspended bearing structure, low operating vibration, ensuring stable vacuum environment in the chamber

2. Built in gas purging channel can resist corrosive process gases and extend the service life of the pump body

3. Equipped with speed monitoring and fault protection, automatic shutdown under abnormal working conditions to avoid rotor damage

4. Compact body design, suitable for narrow installation space of semiconductor equipment, easy disassembly and maintenance

5. Dry oil-free design, no oil pollution, ensuring wafer process cleanliness

Product Parameters:

1. Material model: EX9698811

2. Pump type: Turbomolecular pump

3. Extreme vacuum: up to 10 ⁻⁹ mbar level

4. Cooling method: air cooling

5. Compatible equipment: Semiconductor vacuum process chamber matching unit

Application fields:

1. Establishment and maintenance of high vacuum environment in semiconductor etching chamber

2. Vacuum extraction of thin film deposition PVD/CVD equipment

3. Vacuum control of wafer surface treatment process chamber

4. High vacuum supply for mass spectrometry and vacuum detection equipment

5. Replacement and maintenance of spare parts for vacuum systems in semiconductor production lines

This Agilent EX9698811 turbomolecular pump is a core component of semiconductor vacuum systems, responsible for providing a clean high vacuum environment and ensuring stable operation of various plasma processes. By checking the model, it can be directly replaced on the machine.

Product imag

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