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  • Daihen 3D80-001480-V1 RF Generator
  • Daihen 3D80-001480-V1 RF Generator
  • Daihen 3D80-001480-V1 RF Generator
Daihen 3D80-001480-V1 RF Generator Daihen 3D80-001480-V1 RF Generator Daihen 3D80-001480-V1 RF Generator

Daihen 3D80-001480-V1 RF Generator

Daihen 3D80-001480-V1 RF Generator 

 Introduction

The Daihen 3D80-001480-V1 RF generator is a core high-frequency power source used in semiconductor equipment to excite plasma.

Product Features:

1. Good stability of power output, minimal fluctuations in plasma operating conditions, and high process repeatability

2. Built in multiple fault protection, capable of quickly cutting off output in case of standing wave abnormality or over temperature overload

3. Support pulse output mode, able to flexibly adapt to different etching and thin film process requirements

4. The overall heat dissipation design of the machine is reliable, meeting the long-term uninterrupted mass production operation of the production line

5. Original standard interface, directly matched with machine control system, easy to replace and debug

Product Parameters:

1. Adapt to the original communication protocol of the device and work in conjunction with external matching devices

2. Equipped with standing wave detection feedback function, real-time monitoring of load reflection status

3. Tolerate the working environment temperature inside the cabinet and adapt to the internal heat dissipation conditions of the equipment

4. Support remote signal control and receive power commands issued by the entire system

5. Fault status can output alarm signals, making it convenient for operation and maintenance to quickly locate problems

Application fields:

1. Plasma excitation power supply for semiconductor etching machine chamber

2. PECVD thin film deposition equipment RF source matching use

3. Power supply for plasma cleaning process on wafer surface

4. Replacement of aging spare parts for RF power supply of imported second-hand semiconductor equipment

5. Plasma process debugging and use after equipment maintenance and repair

In actual operation and maintenance, Daihen 3D80-001480-V1 directly determines the quality of the chamber plasma and is a key component affecting wafer yield

Product imag

3D80-001480-V1.webp.jpg


ontroller Module

ICS TRIPLEX T9431 controller module
REF615E-D HBFDACADANB1BNN1XD display
 REF615E-E HBFAABAANAA4BNA11E Operation panel

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