HORIBA SEC-Z511X Mass Flow Controller
Introduction
HORIBA SEC-Z511X Mass Flow Controller
1. SEC-Z511X has high flow control accuracy and excellent gas transport stability
2. Equipped with variable PID algorithm, fast response speed across the entire range
3. The contact medium is polished 316L stainless steel, suitable for various process gases
4. Excellent airtightness, low leakage rate, meeting clean process standards
5. SEC-Z511X supports analog signal input and output, easy debugging and docking
6. Strong ability to withstand pressure fluctuations, and flow rate is not easily offset under pressure changes
7. Built in electromagnetic protection structure to resist electromagnetic interference in the workshop environment
8. Valve control regulation is stable, effectively suppressing airflow impact fluctuations
9. Wide working temperature range, suitable for semiconductor cleanroom conditions
10. SEC-Z511X has real-time flow monitoring for easy process tracking
11. Standard VCR interface, simple and efficient disassembly and maintenance of pipelines
12. Supports multiple commonly used process gases, with a wide range of equipment adaptability
13. Compact integrated structure, saving cabinet installation space
14. Equipped with fault self checking function, quickly identify abnormal traffic flow
15. Original factory rigorous aging testing, low failure rate during long-term continuous operation
HORIBA SEC-Z511X Mass Flow Controller for Precise Gas Flow Control in Semiconductor Etching and Thin Film Equipment Processes
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| IS220PAICH2A IS220PAICH2B | 52010-00 | IMDSI02 |
| IS220PAICH1A IS220PAICH1B | SS2000PCI-2 | IMSET01 |
| IS215UCVGH1A | HA42A6-R233 | IMDS001 |
| IS215UCVFH2AB | SE06200-000000 | IMASI03 |
| IS215ACLEH1C | S60300-NA | IMASOO1 |
| IS215ACLEH1B | SLO-SYN430P1 | INICT01 |
| IS215ACLEH1A | H3801 | 47545701 |