Tokyo Electron 3D80-000300-13 Turbomolecular Pump

Tokyo Electron 3D80-000300-13 Turbomolecular Pump

Product Details Introduction

The Tokyo Electron 3D80-000300-13 turbomolecular pump is a high-performance vacuum pumping device designed specifically for high vacuum process environments in semiconductor manufacturing equipment. It is typically integrated into vacuum process platforms under Tokyo Electron (TEL), such as etching, deposition, ion implantation, and other systems. The following is a detailed analysis of the application areas of the pump:

1、 Product Function Overview

Type: High speed turbo molecular pump

Function: Quickly establish and maintain high vacuum in the vacuum chamber (usually within the range of 10 ⁻⁵ to 10 ⁻⁸ Torr)

characteristic:

High pumping speed

low vibration

Can be linked with the dry front-end pump

Suitable for corrosive or inert gas environments

2、 Main application areas

1. Plasma Etcher

Used to maintain a stable high vacuum inside the cavity, ensuring uniform plasma formation and reaction control.

Support fast pumping response to meet the rhythm of high-throughput production.

2. CVD/ALD thin film deposition equipment

Maintain a low pressure environment in the sedimentation chamber to avoid the deposition of impurity particles.

Helps to improve the purity and surface quality of the film layer.

3. Ion implantation equipment

Maintain ultra-high vacuum during ion beam implantation to reduce collisions between gas molecules and ions.

Improve doping accuracy and reduce device defect rate.

4. PVD evaporation/sputtering system

Quickly establish a reference vacuum before sputtering.

Maintain a stable vacuum during the process to control the deposition path of evaporated materials.

5. Testing and analysis equipment

In vacuum dependent analyzers such as SEM, XPS, RIE, etc., turbo molecular pumps are often configured to achieve the necessary vacuum degree.

Product imag

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