Mattson Technology 303-16537-00 Wafer Platform Heater

Mattson Technology 303-16537-00 Wafer Platform Heater 

 Introduction

Mattson Technology 303-16537-00 Wafer Platform Heater

Product Features:

1. Aluminum nitride ceramic substrate, multi zone heating circuit, good temperature uniformity of the entire wafer

2. Integrated temperature sensing acquisition, combined with closed-loop temperature control of the machine, with fast temperature response speed

3. The surface is corrosion-resistant and resistant to plasma erosion, and has a longer service life in harsh environments with etching chambers

4. Equipped with an overheat protection mechanism, it limits power output in case of abnormal temperature to prevent damage to the disk body

5. Integrated base structure, easy to disassemble and replace on site, no need to modify the cavity pipeline route

Product Parameters:

1. Material model: 303-16537-00

2. Substrate material: high-purity aluminum nitride ceramic

3. Temperature control mode: Multi zone independent heating control

4. Temperature measuring element: built-in thermocouple

5. Compatible equipment: Mattson plasma etching machine

Application fields:

1. Precise constant temperature control of semiconductor dry etching wafer substrate

2. Temperature control of plasma debonding process wafers

3. Thin film etching process ensures temperature consistency on the wafer surface

4. Plasma processing chamber wafer carrying heating station

5. Replacement and maintenance of spare parts for Mattson etching equipment wafer heating platform

This Mattson Technology 303-16537-00 wafer platform heater is the core stage component of the etching chamber, with temperature control zones to ensure uniform and stable wafer processes. By checking the model, it can be directly replaced on the machine.

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