XEI 232260-01 Plasma Cleaner

XEI 232260-01 Plasma Cleaner

 Introduction

XEI 232260-01 plasma cleaner

1. Adapt to high vacuum analysis equipment such as SEM and FIB to remove organic pollutants such as hydrocarbons in the chamber

2. Remote free radical cleaning process, low-temperature operation, to avoid damage to precision samples and optical components

3. XEI 232260-01 relies on radio frequency excitation plasma to efficiently decompose various organic residual impurities

4. Support air as a process gas source, without the need for continuous supply of special high-purity process gases

5. Built in closed-loop control of operating parameters to maintain stable plasma excitation conditions

6. XEI 232260-01 is equipped with pressure and power anomaly monitoring, and automatically triggers safety protection in case of faults

7. Can be controlled locally through the panel, and also supports communication interface docking with the upper computer for remote control

8. Standardization of cavity interface specifications for easy integration and installation into various vacuum equipment cavities

9. XEI 232260-01 cleaning process without physical sputtering, protecting the detector and vacuum window components

10. Built in process recipe storage function, one click call to mature cleaning programs to carry out operations

11. Low operating noise, suitable for laboratory and semiconductor cleanroom working environments

12. XEI 232260-01 onboard operating condition indicator light, visually identifying plasma start stop status

13. Lightweight and compact body layout, saving installation space around vacuum equipment

14. Having complete operation log records, convenient for tracing the cleaning process and fault information

15. Complete vacuum online testing at the factory to ensure long-term stable and continuous cleaning operations

XEI 232260-01 plasma cleaner is widely used in in-situ cleaning units of electron microscopy and focused ion beam equipment chambers

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