ADTEC 0190-24250 RF Plasma Generator

ADTEC 0190-24250 RF Plasma Generator 

 Introduction

ADTEC 0190-24250 RF plasma generator, also known as AX-3000 III, is commonly used in semiconductor processes

1. Equipped with a linear amplifier circuit, the power output is stable and the process repeatability is good

2. Built in fast arc detection and suppression function, which can quickly protect against ignition

3. It can withstand high reflection power and is not easy to shut down when the cavity impedance fluctuates

4. Support pulse RF output, suitable for fine etching and thin film deposition processes

5. Comes with multiple types of communication interfaces for easy access to the device's main control system for linkage control

1. Model 0190-24250 (AX-3000 III)

2. Maximum output power 2300W

3. Standard RF frequency 13.56MHz

4. Rack mounted installation, compatible with semiconductor machine standard cabinets

5. Air cooled cooling design, easy maintenance

This generator is suitable for process scenarios focused on vacuum plasma processes

1. Semiconductor wafer etching equipment

2. Thin film PVD and CVD deposition processes

3. Plasma cleaning of wafer surface

4. Plasma processing of MEMS devices

5. Plasma treatment of flat panel display panel

Overall, ADTEC 0190-24250 is a mature and stable RF source commonly used in precision semiconductor vacuum plasma processes

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