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Hitachi M-05A2LS-400K RF Controller

Introduction

Hitachi M-05A2LS-400K

1. M-05A2LS-400K is compatible with Hitachi semiconductor etching equipment dedicated RF control unit

2. Rated 400KHz operating frequency band, precise control of RF output power and frequency

3. Closed loop real-time sampling feedback, stable RF output power with minimal fluctuations

4. Equipped with automatic power calibration, long-term operation parameters are not easily offset

5. Built in multiple hardware protections for over power, over temperature, and high standing wave

6. Modular card insertion and removal structure, easy to disassemble, replace, and repair, saving time and effort

7. Cleanroom grade components, suitable for dust-free wafer production workshop environment

8. Built in RF filtering circuit to suppress stray signals and avoid interference with cavity technology

9. Optoelectronic isolation IO interface, connected to the whole machine interlocking and status acquisition signals

10. Temperature controlled heat dissipation design, stable temperature rise control during long-term full load operation

11. Can communicate and link with the equipment master to remotely issue process parameters

12. Having operational data records and retaining abnormal operating conditions for easy fault tracing

13. Strengthen PCB circuits to prevent virtual soldering and detachment under equipment vibration conditions

14. The power rise and fall speed is smooth and controllable, preventing severe fluctuations in the cavity plasma

15. High precision electrical calibration at the factory to ensure consistency in semiconductor processes

Hitachi M-05A2LS-400K semiconductor process specific RF controller, stable control of cavity plasma RF energy output.

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ontroller Module

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