TEL 2L80-050254-V1 pressure regulator

TEL 2L80-050254-V1 pressure regulator

 Introduction

TEL 2L80-050254-V1 pressure regulator

1. Adapt to Tokyo Electronic Semiconductor process equipment to achieve precise pressure regulation of process gases

2. Diaphragm type balance structure, excellent pressure control linearity, and suppression of pipeline pressure fluctuations

3. High purity fluid pathway, clean inner wall treatment, meeting semiconductor dust-free process standards

4. High sealing components effectively eliminate the risk of trace gas leakage

5. Rapid dynamic response, quickly compensating for upstream and downstream pressure changes and interference

6. Built in overload pressure protection to prevent valve body damage caused by pressure impact

7. Compact body structure, easy to integrate and install in narrow spaces of the machine

8. Excellent temperature resistance, suitable for temperature fluctuations around the cavity

9. Support long-term uninterrupted mass production and continuous operation, with strong stability in working conditions

10. Standardized interface specifications that can directly match original factory pipeline components

11. Anti vibration structure design ensures that the machine operates in a vibration environment that is not prone to drift

12. The pressure setting is long-lasting and stable, reducing the frequency of frequent calibration and maintenance

13. Can be combined with pressure sensing components to achieve pressure signal feedback monitoring

14. Wear resistant design of internal components to extend the overall service life of the valve body

15. Original precision machining technology, with small long-term operation and adjustment errors

The TEL 2L80-050254-V1 pressure regulator is commonly used in TEL etching and thin film deposition equipment, and is the core valve body component for pressure stability control in the process gas supply circuit.

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