Gasonics AWD-D-1-0-023-010 plasma power module

Gasonics AWD-D-1-0-023-010 plasma power module

Product Details Introduction

Product Name: Gasonics AWD-D-1-0-023-010 Plasma Power Supply Module

Component type: RF Plasma Power Supply Module

Main function: Provide radio frequency (RF) energy for plasma processing equipment to generate and maintain the plasma state inside the process chamber

1、 Plasma excitation core components

This module provides high-frequency RF power for plasma ashing or etching processes, exciting process gases (such as O ₂, CF ₄) inside the cavity to form plasma for removing photoresist or surface treatment.

Key parameter characteristics (typical values, to be confirmed on-site):

RF power range: approximately 0-600W (depending on the matching cavity and gas type)

Output frequency: typically 13.56 MHz according to industry standards

Working mode: Continuous Wave (CW) or Pulsed RF

Cooling method: air cooling or forced air duct cooling

2、 Used for critical plasma treatment processes

Gasonics AWD-D-1-0-023-010 is widely used in the following processing flows in semiconductor manufacturing equipment:

The application process includes:

Photoresist Ashing: Using O ₂ plasma to remove residual adhesive from the wafer surface

Surface treatment: improve adhesion, remove pollutants

Mild etching: performing low rate material removal treatment (such as surface etching)

3、 Electrical integration with the entire system

This module is generally integrated into the main equipment electrical cabinet and connected to the main control system, matching network, and current/reflected power monitoring module through interfaces.

Typical Connection Relationship:

Receive startup/power setting commands (analog or digital control) from the main control system

Linked with the RF matching network module, automatically tuned to reduce reflected power

Return the actual power, reflected power, and alarm status to the system monitoring software

Product imag

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