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  • TEL Tokyo Electron 2908-600386-12 Controller Module
  • TEL Tokyo Electron 2908-600386-12 Controller Module
TEL Tokyo Electron 2908-600386-12 Controller Module TEL Tokyo Electron 2908-600386-12 Controller Module

TEL Tokyo Electron 2908-600386-12 Controller Module

TEL Tokyo Electron 2908-600386-12 Controller Module

Product Details Introduction

The TEL Tokyo Electron 2908-600386-12 controller module is the core control component used by Tokyo Electron in semiconductor manufacturing equipment, mainly responsible for instruction execution, status monitoring, and subsystem coordination during equipment operation. This type of controller module is widely used in various TEL process equipment. The following is an overview of its applications:


1、 Product type

Module Name: 2908-600386-12

Module category: Controller Module

Applicable manufacturer: Tokyo Electron Ltd. (TEL)

Main function: Equipment control logic execution and subsystem coordination management


2、 Main functions

Main control processing function


Manage the logical control and process execution of various parts of the equipment, such as gas, temperature control, vacuum, drive, etc.


Support multi-channel and multi process parallel control to ensure the accuracy and consistency of equipment processes.


Interface management function


Responsible for coordinating data exchange among modules such as sensors, actuators, and driver boards;


Provide communication connections with host systems such as industrial computers or central control systems.


Operation monitoring and diagnosis


Real time monitoring of system status, recording of operating parameters, supporting functions such as anomaly detection, alarm, interlock protection, etc.


Program loading and firmware control


Can store or load customized control programs;


Support version management and control logic updates.


3、 Typical application areas

This module is commonly found in the following TEL semiconductor devices:


Dry etching equipment (Etchers)


Control parameters such as chamber gas, RF power supply, electrode voltage, etc.


CVD/ALD thin film deposition equipment


Manage precise processes such as gas switching and temperature control of reaction chambers.


Wafer Cleaning System (Wet Station)


Control the spraying of cleaning solution, mechanical arm movement, drying process, etc.


Photolithography coating/developing equipment (Track Systems)


Control the collaborative operation of multiple sub processes such as spin coating, pre drying, development, and cooling.

Product imag

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