TEL Tokyo Electron 3D81-000044-V3 processor module

TEL Tokyo Electron 3D81-000044-V3 processor module

Product Details Introduction

The TEL Tokyo Electron 3D81-000044-V3 processor module is a critical control and data processing component in Tokyo Electron semiconductor manufacturing equipment, typically used as the main control core or distributed intelligent control node of the entire system. This module has high computing power, industrial grade stability, and multiple communication interfaces, suitable for real-time control and computing needs in various advanced TEL devices.

1、 Basic Product Information

Product model: 3D81-000044-V3

Product Name: Processor Module

System: TEL Semiconductor Manufacturing Equipment Control Platform

Functional positioning: Embedded control computing module/main control or sub control unit

2、 Core functions and roles

Detailed description of functional categories

The main control logic of the equipment handles the execution of process flow control logic, action sequence arrangement, and status management.

Real time data collection and processing of sensor signals (temperature, pressure, gas flow, etc.) and response.

Communication coordination and communication with upper level systems (such as HMI, MES) and other control boards. Supports multiple protocols (such as RS-232, Ethernet, CAN).

Fault detection and alarm provide equipment operation monitoring, fault self diagnosis, and abnormal state alarm functions.

Real time multitasking control simultaneously coordinates the work of multiple subsystems, such as heating systems, vacuum systems, handling systems, etc.

3、 Applicable equipment system (example)

The 3D81-000044-V3 processor module is widely integrated into the following TEL equipment systems:

Possible uses of system name

TEL Unity ™  II CVD controlled thin film deposition chamber process and temperature control system.

TEL Telius ™  Etch controls plasma etching parameters such as RF power supply, gas flow rate, chamber vacuum, etc.

TEL Trias ™  Accurate pulse control and airflow path switching for ALD controlled atomic layer deposition.

TEL Clean Track ™  The series is used for motion control in wafer processing systems such as development and cleaning.

Product imag

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