LAM 660-072826-200 RF Generator

LAM 660-072826-200 RF Generator

Product Details Introduction

The LAM 660-072826-200 RF generator is mainly used in semiconductor manufacturing and related high-precision processes, especially in application scenarios that require precise plasma control. It provides stable and reliable RF energy for plasma generation and control. The following are its main application areas:

1. Semiconductor manufacturing:

Chemical Vapor Deposition (CVD): During the CVD process, a radio frequency generator provides the necessary energy to activate the reaction gas and form a thin film. This is crucial for manufacturing integrated circuits, thin film transistors, and so on.

Plasma etching: Radio frequency generators are used to generate plasma during the etching process to remove unwanted materials or form fine patterns on silicon wafers. This is a crucial step in manufacturing integrated circuits and other microelectronic components.

Physical Vapor Deposition (PVD): During the PVD process, a radio frequency generator helps activate gas molecules to deposit thin films on a substrate for use in electronic devices and solar cells.

2. Plasma treatment:

Plasma cleaning: In semiconductor and display manufacturing, RF generators can be used in plasma cleaning processes to remove surface contaminants and ensure product quality and performance.

Surface modification: Radio frequency energy can modify the surface of materials during plasma treatment, increasing their adhesion, wettability, or corrosion resistance, and is widely used in thin film and coating technology.

3. Surface etching and deposition:

Thin film deposition: Radio frequency generators can be used in low-temperature plasma deposition (LPCVD) technology to help precisely control the thickness and uniformity of deposited thin films, and are widely used in fields such as electronics, optoelectronics, and solar energy.

Microelectronics equipment manufacturing: used for etching and removing fine patterns in precision manufacturing processes to ensure high performance and long lifespan of semiconductor devices.

4. Photovoltaic industry:

Solar cell manufacturing: RF generators are also used in the manufacturing process of solar cells, especially in the deposition and etching processes of thin film solar cells, to provide RF energy for controlling the quality and uniformity of the thin film.

5. Scientific research and experimentation:

Plasma physics research: Radio frequency generators are commonly used in laboratory research to study the generation, control, and characteristics of plasma, and are widely applied in fields such as physics and materials science.

Summary:

The application of LAM 660-072826-200 RF generator mainly focuses on semiconductor manufacturing, plasma treatment, and processes related to surface deposition and etching. It supports key manufacturing steps in high-tech industries such as film deposition, etching, and surface treatment by providing precise and stable RF signals.

Product imag

Related website links

Kollmorgen MMC-SD-0.5-230-D servo drive

ASEA YM316001-NL Double Plate Component

Emerson P144.R4 Intelligent I/O Board

Other website links

AMAT 0190-30354 接口板模块

ABB LDGRB-01 数字量扩展模块

ABB LD800HSE 总线模块