Messer EMB39-2001N Gas Mass Flow Controller

Messer EMB39-2001N Gas Mass Flow Controller

Product Introduction

Messer EMB39-2001N is a Messer semiconductor process gas mass flow controller that accurately controls the flow of specialty gases and stabilizes the supply of gas for plasma processes.

Product Features

1. High precision flow control and fast response

2. Compatible with various high-purity and corrosive process gases

3. Built in fault self check, abnormal flow alarm protection

4. Support digital communication and interface with device control systems

5. Stainless steel flow channel, suitable for vacuum clean workshops

Application Fields

1. Gas flow control in semiconductor etching process

2. Gas supply regulation for PVD/CVD film deposition

3. Gas ratio control of plasma cleaning equipment

4. Gas supply for wafer surface treatment process

5. Maintenance and replacement of MFC spare parts on the production line

6. Gas flow control of vacuum coating equipment

7. Material surface modification plasma gas supply

8. Gas control for plasma experiments in scientific research

9. Display panel process gas management

10. Semiconductor process gas path renovation project

Messer EMB39-2001N precisely controls the process gas flow rate and is a commonly used MFC spare part for semiconductor equipment.

Product imag

ontroller Module

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SIMENS 353A4FNCNB4 Automation module

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