AE 3150013-000 RF Generator

AE 3150013-000 RF Generator 

 Introduction

AE 3150013-000 RF Generator

Product Features

1. High output power control accuracy, better repeatability of plasma process

2. Equipped with arc suppression function to reduce ignition and protect cavity components

Strong impedance adaptation capability with matching device for fast and stable illumination

4. Digital signal regulation facilitates remote monitoring of production lines

5. The whole machine has high durability and is suitable for long-term continuous operation of semiconductor equipment

Product Specifications

1. Adopt industrial AC input power supply to adapt to cabinet standard power supply

2 fixed RF output frequencies to meet plasma process requirements

3. Equipped with comprehensive fault self check and alarm signal output

4 Supports various industrial communication methods such as Ethernet serial ports

5. Water cooling and heat dissipation design for stable temperature control under high-power operating conditions

Application Areas

1. Power supply unit for semiconductor wafer plasma etching process

2 PECVD thin film deposition equipment RF power supply components

3 Vacuum chamber plasma cleaning matching generator

4. Plasma excitation power supply module for optical coating equipment

5 Material surface modification treatment plasma source power supply equipment

This AE 3150013-000 RF generator is widely used in semiconductor vacuum processes and is a commonly used replacement part for many imported equipment

Product imag

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