MKS R5027A-14071 RF Generator

MKS R5027A-14071 RF Generator 

 Introduction

The MKS R5027A-14071 RF generator is a semiconductor plasma process RF power supply responsible for cavity plasma excitation.

Product Features

High precision power control ensures the repeatability of each wafer process.

Built in fast arc suppression, the output power is immediately reduced when the cavity ignites.

Strong load adaptability and ability to cope with dynamic changes in cavity impedance.

The rack mounted compact structure makes it easy to disassemble and replace spare parts on site.

Built in power acquisition and fault self checking, convenient for troubleshooting on the production line.

Product Specifications

Model R5027A-14071 RF generator.

Suitable for semiconductor etching and thin film deposition chambers.

13.56MHz RF operating frequency.

Built in real-time monitoring of forward power and reflected power.

Support digital communication and transmit the operating status back to the machine controller.

Application Areas

Plasma power supply for semiconductor dielectric layer etching.

PECVD thin film deposition with RF excitation.

Repair and replacement of spare parts for old MKS RF equipment.

Supporting plasma cleaning process for cavity.

Compound semiconductor plasma processing equipment.

This RF generator is often used in conjunction with RF matching networks and is a core power supply spare part for wafer thin film and etching processes.

Product imag

ontroller Module

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