Horiba CS-159ESF1-25-SU-P Monitor

Horiba CS-159ESF1-25-SU-P Monitor

 Introduction

Horiba CS-159ESF1-25-SU-P Monitor

1. Adopting the principle of optical absorption detection to monitor the concentration of drug components in real time

2. High measurement accuracy, effectively ensuring the stability of wet process technology

3. Built in temperature compensation module to eliminate measurement deviation caused by temperature

4. Support online continuous monitoring without offline sampling and testing

5. Equipped with concentration upper and lower limit alarm output function

6. Standard communication interface, capable of interfacing with device control systems

7. Corrosion resistant fluid pathway, compatible with various etching and cleaning solutions for semiconductors

8. Miniaturized integrated structure, convenient for machine integration and installation

9. Optical path sealing protection to resist the erosion of liquid vapor

10. Automatic data storage for easy process traceability analysis

11. Fast response speed, quickly capturing concentration fluctuations and changes

12. Modular design, easy disassembly and maintenance of components

13. Anti vibration structure, adapted to the operating environment of production line equipment

14. Measurement range matching semiconductor wet process standard requirements

15. Long term operation with minimal drift reduces frequent calibration frequency

The Horiba CS-159ESF1-25-SU-P monitor is commonly used for wet cleaning and etching processes of wafers, and is a core detection equipment for online control of drug concentration.

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