DAIHEN SR-204333 RF Matcher

DAIHEN SR-204333 RF Matcher        

 Introduction

DAIHEN SR-204333 RF Matcher Product Features

DAIHEN SR-204333 is compatible with semiconductor etching and thin film deposition plasma RF equipment, with stable impedance matching performance.

Adapt to the mainstream 13.56MHz RF frequency band and match various RF power supplies of the same brand

Ultra fast automatic tuning structure, quickly completes impedance calibration when there is a sudden change in cavity load

Effectively suppress RF reflection power and improve plasma discharge energy utilization efficiency

Built in high-precision adjustable capacitor components, with high matching accuracy and stable process repeatability

Integrated power real-time detection unit, synchronously collecting incident and reflected power data

Equipped with multiple hardware protections, automatic shutdown protection for over temperature, over power, and mismatch anomalies

Standard equipment communication interface, capable of interacting with the main control of semiconductor machines to exchange data

Compact integrated body, saving installation space inside clean equipment

Built in efficient heat dissipation structure, long-term continuous operation with stable temperature control and no overheating

Adapt to medium power RF operating conditions, covering thin films and etching mainstream wafer processes

Built in self-test program upon startup, automatically verifying the running status of the matching circuit

All metal shielding shell, isolating RF clutter and avoiding interference with surrounding devices

Modular internal structure, faulty components can be disassembled, repaired, and replaced separately

Wear resistant original components, supporting 24/7 uninterrupted operation on the production line

Standardized docking interface, easy disassembly and maintenance, no need to shut down the entire machine

DAIHEN SR-204333 is a core RF matching component for semiconductor plasma processes, ensuring uniform and stable manufacturing processes.

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