Home > Product > DCS control system > Daihen 3D39-000004-V2 RF Automatic Matcher

  • Daihen 3D39-000004-V2 RF Automatic Matcher
  • Daihen 3D39-000004-V2 RF Automatic Matcher
  • Daihen 3D39-000004-V2 RF Automatic Matcher
Daihen 3D39-000004-V2 RF Automatic Matcher Daihen 3D39-000004-V2 RF Automatic Matcher Daihen 3D39-000004-V2 RF Automatic Matcher

Daihen 3D39-000004-V2 RF Automatic Matcher

Daihen 3D39-000004-V2 RF Automatic Matcher        

 Introduction

Daihen 3D39-000004-V2 RF Automatic Matcher Product Features

Daihen 3D39-000004-V2 is compatible with semiconductor etching and thin film deposition plasma RF systems, with stable impedance matching performance.

Standard operating frequency of 13.56MHz, compatible with mainstream plasma process RF power supply

High speed automatic tuning circuit, quickly completes impedance matching during sudden load changes

Significantly reduce RF reflection power and improve the utilization efficiency of cavity plasma energy

Built in precision variable capacitor components, high matching accuracy, and good process repeatability

Equipped with real-time power detection module, real-time collection of incident and reflected power data

Multiple hardware protection mechanisms, automatic shutdown protection against over power, over temperature, and mismatch

Standardized communication interface, capable of linked communication with TEL semiconductor equipment master control

Compact body structure saves installation space inside the machine and facilitates wiring

Industrial grade heat dissipation duct, stable temperature control for long-term continuous operation without heat accumulation

Suitable for medium power RF output, compatible with various wafer processes such as thin film and etching

Built in fault self checking program, automatically verifies the matching circuit status upon startup

Anti electromagnetic interference shielding shell, reducing the leakage of RF signals and interfering with equipment

Modular internal structure, faulty components can be disassembled, repaired, and replaced separately

Wide voltage adaptation design to meet the power supply environment of clean workshops in wafer fabs

Long life and wear and tear resistant components, suitable for 7 × 24-hour uninterrupted operation on production lines

Daihen 3D39-000004-V2 is a core impedance matching accessory for semiconductor plasma equipment, ensuring uniform and stable processes.

Product imag

3D39-000004-V2 (1).jpg

ontroller Module

 086329-004 End Column Sensor Module
 086348-001 control module
 086370-001 Logic Controller Module

Other website links

TRICONEX 2000418数字量输出模块
TRICONEX 2000417数字输出模块
TRICONEX 3401通信模块

LB3-48E-Q-01AMAT 0100-9013557120001-P DSAI130
Lam Research 853-230312-008AMAT 0100-90971HESG447220R0004 70EB02C-ES
Lam Research 810-048219-019AMAT 0100-90967HESG223147R0001 70VA01B-E
Lam Research 605-230312-008AMAT 0100-09304NTMP01   
Lam Research 605-064676-005AMAT 0100-76030HESG332143R0001 70EB10A-E
K43HRLM-LNK-NS-01AMAT 0100-40037HESG447260R0002 70BA01C-S


Obtain the latest price of Daihen 3D39-000004-V2 RF Automatic Matcher