MKS AX7695 Remote Plasma Source

MKS AX7695 Remote Plasma Source

Product Details Introduction

MKS AX7695 is a remote plasma source produced by MKS Instruments, mainly used to provide reactive gases in semiconductor manufacturing processes.

Main features:

High performance: Provides up to 6.0 standard liters per minute (slm) of oxygen or oxygen nitrogen mixed gas flow, meeting the reactive gas requirements for semiconductor processing.

Multiple gas supply: Supports ignition gas supply of 100% oxygen, argon, or 90% oxygen/10% nitrogen to meet different process requirements.

Integrated design: Integrating the quartz vacuum chamber, radio frequency (RF) power supply, and all necessary control functions into a compact self-contained unit, making it easy to install directly on the tool's process chamber.

High reliability: designed to meet the high requirements of semiconductor manufacturing environments, with excellent durability and stability.

Application areas:

This remote plasma source is widely used in the semiconductor manufacturing industry, especially in the following processes:

Thin film deposition: used to deposit thin films on the surface of silicon wafers.

Etching: Used to etch patterns on silicon wafers.

Cleaning: Used to clean the surface of silicon wafers and remove organic pollutants.

Product imag

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