Product Introduction
The FEI GIS 26833-E controller is a gas injection control unit for electron microscopes, which accurately controls the timing and flow rate of process gas injection, and is suitable for processes related to focused ion beams and scanning electron microscopes. Its application areas are as follows:
1. FIB focused ion beam etching system
2. Scanning electron microscopy in-situ gas deposition platform
3. Semiconductor circuit repair and processing equipment
4. Chip Failure Analysis Electron Microscope Workstation
5. In situ reaction chamber for transmission electron microscopy
6. Micro nano processing equipment for MEMS devices
7. In situ gas-phase reaction observation platform for materials
8. Wafer micro area repair process device
9. Nano material gas-phase synthesis observation system
10. In situ processing platform for biological sample electron microscopy
11. In situ testing of gas-phase corrosion of metal materials
12. Optical Device Microstructure Modification Equipment
13. In situ catalytic experimental platform for scientific research electron microscopy
14. Power device defect repair system
15. Equipment for Micro Nano Characterization Laboratory in Universities
The FEI GIS 26833-E controller has precise gas injection timing, strong adaptability to vacuum conditions, and can be linked with the electron microscope host to stably complete coordinated control of gas supply, process reaction, and in-situ observation.
Product imag

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| IC3600SFVA1 | 6DD1682-0CD0 | IC3600SSVF1 |
| IC3600SFUC1B | 6DD1682-0CC0 | IC3600SSVE1 |
| IC3600SFUC1 | 6DD1682-0BE0 | IC3600SSVD1J1B |
| IC3600SFUB1 | 6DD1682-0BC4 | IC3600SSVD1H |
| IC3600SFUA1C | 6DD1682-0BC3 | IC3600SSVD1 |
| IC3600SFUA1 | 6DD1682-0BC0 | IC3600SSVB1B |
| IC3600SFPB1B1C | 6DD1683-0CC0 | IC3600SSVB1 |