Brooks GF125C-207009 Mass Flow Controller

Brooks GF125C-207009 Mass Flow Controller

Product Introduction

Brooks GF125C-207009 Mass Flow Controller

Product Features

All metal sealed flow path suitable for high-purity process gas without leakage and pollution risk

Built in MultiFlo technology supports online switching of multiple gas parameters without the need for disassembly

Thermal sensing principle, flow control, fast response, excellent repeatability and measurement accuracy

Corrosion resistant Hastelloy alloy sensors are resistant to various corrosive process gases

Integrated self diagnostic function for real-time monitoring of valve and sensor operating status

Product application areas

Semiconductor PVD thin film deposition equipment

CVD chemical vapor deposition process chamber

Plasma etching gas delivery system

Wafer cleaning process gas supply unit

MOCVD epitaxial growth equipment

Photovoltaic cell coating production line

Laboratory vacuum process gas supply platform

Optical coating vacuum coating equipment

Material surface modification equipment

Semiconductor ashing and gel removal gas control system

Product Specifications

Measurement principle: Thermal mass flow detection

The communication protocol supports RS485 and analog signal communication

Flow path structure: Metal sealed high-purity flow path

Brooks GF125C-207009 mass flow controller provides high-precision gas flow regulation and stable control for semiconductor vacuum processes, ensuring consistent wafer process gas supply

Product imag

ontroller Module

 AO610 Analog quantity interface module
 ARC093AV1 HIEE300690R1 Switching value module
 CI625 Analog quantity module

Other website links

ALSTOM DFI-150-0003火焰指示器电路板
 LTC743CE02 3BHE013299R0002智能型变压器控制器
HIMA F3 DIO 20/8 02数字输入/输出模块