AMAT 0190-51023 RF Matcher

AMAT 0190-51023 RF Matcher

 Introduction

AMAT 0190-51023 RF Matcher

Product Features

Fast automatic impedance tuning reduces RF reflection power to ensure stable plasma process

Built in arc detection and suppression function reduces chamber ignition and protects wafers and target materials

Support machine communication interaction and remote monitoring of matching status and parameters

The integrated water-cooled heat dissipation structure is suitable for long-term continuous process operation

Original factory standardized structure for easy disassembly and assembly, reducing equipment downtime and maintenance time

Application Areas

AMAT etching cavity RF impedance matching adjustment

RF power matching of PVD physical vapor deposition chamber

Plasma RF Circuit Control in CVD Thin Film Deposition Process

RF impedance adjustment for wafer plasma surface treatment

Replacement and maintenance of spare parts for RF matching devices in semiconductor production lines

Refurbishment and renovation of chip equipment with RF matching unit

Research and development of experimental plasma equipment RF load matching

RF power control of photoresist plasma ashing process

RF source cavity matching for magnetron sputtering coating equipment

RF Energy Transmission Control of ICP Plasma Process Chamber

The model of this RF matching device used for semiconductor plasma cavity RF impedance adjustment is AMAT 0190-51023

Product imag

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