MKS OPT-50Z-00 DC plasma generator

MKS OPT-50Z-00 DC plasma generator

 Introduction

MKS OPT-50Z-00 DC plasma generator

Product Features

Digital DSP power control output, stable power accuracy, high guarantee of thin film process repeatability

Built in arc suppression function reduces the risk of target ignition and wafer damage

Rich communication and simulation interfaces support remote settings and machine status monitoring

Rack mounted compact structure with air-cooled cooling is suitable for long-term continuous operation inside the cabinet

Multiple circuit protection with overvoltage, overcurrent, overheating fault alarm and shutdown function

Application Areas

Direct current plasma excitation for semiconductor PVD sputtering coating process

Metal thin film deposition chamber target material power supply driving unit

Plasma cleaning and activation treatment of wafer surface

Replacement and maintenance of spare parts for plasma power supply in semiconductor production line

Refurbishment and renovation of chip equipment with matching DC plasma source

Research and development of experimental vacuum sputtering equipment plasma generation unit

Plasma power supply for optical coating preparation process

DC power module for magnetron sputtering equipment chamber

Plasma generation control in hard film deposition process

Power control of semiconductor device metallization process

The model of the DC plasma generator used for magnetron sputtering thin film deposition is MKS OPT-50Z-00.

Product imag

ontroller Module

 PFSK112 YM322001-ES Output channel card
 PFSK115 YM322001-EX Input channel card
 YPK110E Input channel card

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