ENI MWH-5-01 Automatic Matching Controller

ENI MWH-5-01 Automatic Matching Controller

 Introduction

ENI MWH-5-01 Automatic Matching Controller

Product Features

Wide load impedance automatic fast tuning to maintain stable RF power transmission

Support automatic and remote dual-mode control adaptation to 13.56 MHz RF system

Built in power monitoring and fault protection reduce the risk of RF reflection damage

The serial port and analog signal interface can be directly connected to the main control of the semiconductor machine

The split type tuning and control unit structure is convenient for on-site maintenance and repair

Application Areas

RF impedance matching control of semiconductor plasma etching chamber

Automatic tuning of RF circuit for PVD physical vapor deposition equipment

RF power matching control in CVD thin film deposition process

RF matching unit for plasma modification process on wafer surface

Replacement and maintenance of spare parts for RF matching devices in semiconductor production lines

Refurbishment and renovation of chip equipment, RF system supporting components

RF impedance adjustment of experimental plasma equipment for research and development

RF matching control of photoresist plasma ashing process

RF source and cavity matching unit for vacuum coating equipment

RF power regulation of ICP plasma process chamber

The model of this automatic matching controller used for automatic adjustment of RF impedance in semiconductor plasma equipment is ENI MWH-5-01.

Product imag

ontroller Module

 PFSK111 5735175-C Output channel card
 PFSK112 YM322001-ES Output channel card
 PFSK115 YM322001-EX Input channel card

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