AE 3155999-080 RF Matching Component

AE 3155999-080 RF Matching Component

 Introduction

AE 3155999-080 RF matching component, AE automatic impedance matching unit, used to match the impedance of the process chamber and efficiently deliver RF power into the plasma chamber.

Product Features

1. Adaptive tuning logic, quickly locking the matching point when the cavity impedance suddenly changes

2. Built in directional coupling sampling, real-time acquisition of forward and reflected RF power

3. The arc detection is sensitive, and the power protection of the RF source is reduced when the cavity ignites

4. The capacitor motor drives smoothly and is not easily stuck after long-term repeated tuning

5. Water cooling and heat dissipation design, high-power continuous operation with controllable temperature rise

6. Communication interface compatible with AMAT machine, bidirectional transmission of matching status information

7. Wide tunable range, supporting switching between multiple process formulas

8. The RF circuit shielding on the cavity side is well done to reduce external electromagnetic radiation

9. Equipped with parameter storage, the preset formula can be quickly retrieved after changing the cavity

10. The internal components have undergone aging screening, resulting in a low failure rate under mass production conditions

Application Areas

11. AMAT plasma etching process chamber

12. PVD thin film deposition RF circuit

13. Plasma surface modification treatment of wafers

14. Semiconductor dry adhesive removal equipment

15. High power RF plasma process system

AE 3155999-080 RF matching component has sensitive arc protection and a wide tuning range, making it a core supporting spare part for RF links in semiconductor plasma processes.

Product imag

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