Semitool 250T0025-01 lifting and rotating HD rotor

Semitool 250T0025-01 lifting and rotating HD rotor 

 Introduction

Semitool 250T0025-01 lifting and rotating HD rotor

Product Features:

1. Integrated lifting and rotating dual action structure, capable of smoothly clamping wafers to complete wet process station switching

2. Surface corrosion-resistant coating, resistant to various acidic and alkaline liquids, suitable for semiconductor wet cleaning environment

3. High precision positioning bearings with minimal vibration during operation, ensuring uniform spraying of the entire wafer's chemical solution

4. Built in position sensing feedback can transmit lifting and rotating signals to the machine to prevent wafer collision

5. Modular assembly structure, easy on-site disassembly and assembly, no need to extensively dismantle tank pipelines

Product Parameters:

1. Material model: 250T0025-01

2. Compatible wafer: 150mm (6 inches)

3. Drive mode: pneumatic lifting+servo rotation

4. Material substrate: corrosion-resistant special alloy

5. Compatible equipment: Semitool Equinox wet cleaning machine

Application fields:

1. Single wafer wet cleaning process for 6-inch semiconductor wafers

2. Washing station for residual glue and impurities after wafer etching

3. Chemical immersion and spin drying on the wafer surface

4. Execution of wet process wafer handling, lifting and positioning actions

5. Replacement and maintenance of spare parts for Semitool cleaning machine rotating rotor

This Semitool 250T0025-01 lifting and rotating HD rotor is the core moving component of wet cleaning equipment, responsible for wafer rotation, spin drying, and workstation lifting to ensure stable cleaning effect. By checking the model, it can be directly replaced on the machine.

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