AMAT 0920-00085 RF Generator

AMAT 0920-00085 RF Generator 

 Introduction

AMAT 0920-00085 RF generator is a semiconductor machine used as an RF power source to excite chamber plasma.

Product Features:

1. Stable power output with minimal plasma state fluctuations during load fluctuations

2. Multiple safety protections, high standing wave, over temperature overload will quickly cut off the output

3. Support pulse output mode, suitable for various etching and thin film processes

4. Reliable heat dissipation capability, capable of meeting the continuous production of 7 × 24 hours on the production line

5. Original modular design, easy on-site replacement and debugging on the machine

Product Parameters:

1. Compatible with the original communication bus and can work in conjunction with external matching devices

2. Built in standing wave detection, real-time collection of circuit reflection power

3. Can withstand the normal operating temperature inside the cabinet

4. Support remote issuance of power control commands for the entire system

5. Fault output alarm signal, easy to repair and quickly locate the problem

Application fields:

1. AMAT etching equipment chamber plasma excitation power supply

2. PECVD thin film deposition equipment RF power supply matching use

3. Power supply for wafer plasma cleaning process

4. Replacement of spare parts for aging and damaged RF units of old machines

5. Plasma process debugging after equipment maintenance

The power output quality of AMAT 0920-00085 directly affects the chamber process efficiency and wafer production yield

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