Tokyo Electron 2L39-000065-31 Generator

Tokyo Electron 2L39-000065-31 Generator

Product Details Introduction

Tokyo Electron 2L39-000065-31 Generator - Detailed Explanation of Product Application Fields

1. Power source in RF/plasma power supply system

Core function: 2L39-000065-31 generator may serve as a radio frequency (RF) power generation module for plasma sources, providing high-frequency electrical energy for plasma processes such as etching or CVD.

Applicable processes: such as reactive ion etching (RIE), inductively coupled plasma (ICP), plasma cleaning, PECVD and other semiconductor manufacturing processes.

Process advantages: Stable output RF power, ensuring stable plasma excitation, improving process repeatability and process control accuracy.

2. Specialized electrical energy conversion module for semiconductor equipment

Power role: As an internal power generation component, it provides customized voltage/frequency conversion for specific process modules.

Multiple forms: It can be used for power generation in different frequency ranges such as DC, RF, or intermediate frequency (MF), and works together with matching devices, rectifiers, and other modules.

Interface application: usually integrated with RF matching networks, temperature control modules, electrodes, or reaction chambers.

3. Equipment autonomous energy supply and process stability guarantee

System independence: The built-in power generation module can reduce dependence on external power grid fluctuations and enhance the overall anti-interference ability of the machine.

Dynamic response: supports fast start-up and power adjustment to meet the requirements of different stages of the process.

Product imag

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