TEL Tokyo Electron 1D80-003300-11 Valve Angle Valve

TEL Tokyo Electron 1D80-003300-11 Valve Angle Valve

Product Details Introduction

TEL Tokyo Electron 1D80-003300-11 valve angle valve is a key component used for precise gas control in semiconductor equipment. This component plays the role of "on/off" and flow regulation in vacuum or gas processing systems, mainly used for the distribution, isolation, and regulation of process gases.

1、 Product Name

Component model: 1D80-003300-11

Product Description: Valve Angle Valve (possibly a high-purity gas valve with drive)

Applicable equipment: Tokyo Electron (TEL) semiconductor process equipment, such as CVD, Etcher, ALD and other systems

2、 Function and Function

Gas circulation control

Control the on/off state of specific process gases (such as SiH ₄, NH3, O ₂, etc.) in the semiconductor process chamber.

Vacuum isolation function

Used as an isolation valve between vacuum chambers and gas sources, it has excellent sealing performance.

Structural design of angle valve

The flow channel has a 90 degree structure, which is suitable for compact space layout inside the equipment and reduces the risk of particle accumulation.

Automated driver support

Most of them are driven by pneumatic or electric means, and can be remotely opened and closed by system control signals.

3、 Typical application areas

CVD (Chemical Vapor Deposition) system

Control the precursor gas entering the reaction chamber to ensure deposition thickness and uniformity.

plasma etching system

Control the entry or emission of reactive gases to support the stability of the reaction process.

ALD (Atomic Layer Deposition) equipment

Realize precise time controlled gas switching to meet the precision requirements of layer by layer stacking.

Cleaning and exhaust system

Used to turn on/off inert gas paths such as N ₂ and Ar, assisting in equipment cleaning and gas path replacement.

Product imag

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