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Hitachi 1-809004-C Turbomolecular Pump

Product Features

Oil free high-speed rotor structure has high pumping efficiency and can quickly establish a high vacuum environment

High precision of rotor dynamic balance, low operating vibration, and reduced particle pollution in the cavity

Built in speed and temperature monitoring provides real-time feedback on the operating status of the pump body

Integrated multiple protections with overload abnormal shutdown protection function

Compact pump body structure suitable for narrow installation space of semiconductor machines

Application Areas

High vacuum environment generated in semiconductor etching chamber

PVD thin film deposition chamber vacuum maintenance

Gas extraction and vacuum control in CVD process chamber

Rapid establishment of vacuum in wafer load lock chamber

Replacement and maintenance of spare parts for molecular pumps in semiconductor production lines

Refurbishment and renovation of chip equipment, vacuum system matching

Research and development of experimental vacuum equipment for high vacuum acquisition

Vacuum maintenance of ion implantation equipment chamber

Vacuum coating equipment suction unit

Surface analysis instrument ultra-high vacuum chamber pumping

The model of this turbo molecular pump used for high vacuum acquisition in semiconductor process chambers is Hitachi 1-809004-C.

Product imag

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