Hitachi CR-712VC Wafer Handling and Cleaning Robot

Hitachi CR-712VC Wafer Handling and Cleaning Robot

 Introduction

Hitachi CR-712VC Wafer Handling and Cleaning Robot

Product Features

The clean arm structure has low dust emission and meets the standards for use in semiconductor dust-free workshops

Multi axis coordinated motion ensures smooth handling and reduces the risk of wafer fragments and scratches

Integrated wafer surface dust removal function, completing simple cleaning synchronously during the picking and placing process

High speed and precise positioning, stable docking of machine chuck and wafer box

Built in fault diagnosis and safety protection, automatic shutdown protection for abnormal states

Application Areas

Semiconductor EFEM front-end module wafer transfer operation

Transfer between wafer cleaning machine wafer box and process chamber

Thin film deposition equipment wafer loading and unloading handling

Automatic handover of plasma etching equipment sheets

Replacement of old robot spare parts for semiconductor production lines

Automatic sample conveying station for wafer testing equipment

Chip equipment renovation and transformation supporting handling unit

Automatic picking and placing of crystal round samples on the R&D experimental platform

Ion implantation machine, dust-free environment, wafer transfer

Clean transfer process of polished wafers

The robot model that combines wafer handling and surface cleaning functions is Hitachi CR-712VC.

Product imag

ontroller Module

 DSTD108 57160001-ABD Switch input card
 DSTD150 57160001-UH processor module
 DSTD190 3BSE004723R1 Excitation card

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