ENI RPDG-200Z-12029 DC plasma generator

ENI RPDG-200Z-12029 DC plasma generator

 Introduction

ENI RPDG-200Z-12029 DC plasma generator

Product Features

1 pulse DC output stable plasma ignition uniform

2. Built in arc suppression reduces ignition and protects the internal components of the chamber

3. Smooth power regulation process with good repeatability

4. Strong anti-interference ability, suitable for semiconductor cabinet environment

5. Easy disassembly and replacement to shorten equipment downtime and maintenance time

Product Specifications

1. Three phase industrial AC power supply

Rated 20kW pulse DC power output

3. Water cooling and heat dissipation, long-term operation, stable temperature control

4. Support real-time uploading of operational data through remote communication

5 standard cabinet installation dimensions

Application Areas

1. Plasma power supply for semiconductor PVD sputtering process

Pulse plasma excitation for vacuum coating equipment

3 Material surface modification treatment power unit

4 Vacuum chamber plasma cleaning supporting equipment

Replacement of spare parts for MKS ENI plasma power supply

This ENI RPDG-200Z-12029 pulse DC plasma generator belongs to the MKS brand and is commonly used for the maintenance and replacement of thin film process equipment

Product imag

ontroller Module

FOXBORO FBM203 P0914SV Pulse input module
HE693ADC410A Gas turbine control card
IC754VSI12VTD Touch screen

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