ENI DCG-200EH-S0J DC plasma generator

ENI DCG-200EH-S0J DC plasma generator 

 Introduction

ENI DCG-200EH-S0J DC plasma generator

Product Features

Stable DC output with uniform plasma ignition effect

2. Equipped with arc suppression to reduce ignition and protect the internal components of the chamber

3. Smooth power regulation process with good repeatability

4. Strong anti-interference ability and adaptability to semiconductor cabinet environment

5. Easy disassembly and assembly, convenient maintenance, and time-saving replacement

Product Specifications

1. Industrial AC input power supply

2 rated 20000W DC power output

3. Water cooling for long-term operation and stable temperature control

4 supports remote communication and can read the running status

5 standard cabinet installation dimensions

Application Areas

1. Plasma power supply for semiconductor PVD sputtering process

2 Vacuum Coating Equipment DC Plasma Excitation

3. Material surface etching treatment for power supply unit

4 Vacuum chamber plasma cleaning matching

Replacement of spare parts for 5 semiconductor old power supplies

This ENI DCG-200EH-S0J DC plasma generator is a power supply under MKS, commonly used for maintenance and replacement of thin film process equipment

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