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  • ADTEC AMV-2000AMT Automatic Impedance Matching Unit
  • ADTEC AMV-2000AMT Automatic Impedance Matching Unit
  • ADTEC AMV-2000AMT Automatic Impedance Matching Unit
ADTEC AMV-2000AMT Automatic Impedance Matching Unit ADTEC AMV-2000AMT Automatic Impedance Matching Unit ADTEC AMV-2000AMT Automatic Impedance Matching Unit

ADTEC AMV-2000AMT Automatic Impedance Matching Unit

ADTEC AMV-2000AMT Automatic Impedance Matching Unit 

 Introduction

ADTEC AMV-2000AMT Automatic Impedance Matching Unit

Product Features:

1. High speed dynamic impedance adjustment, fast response to changes in plasma chamber load, effectively reducing RF reflection power

2. Built in power monitoring and arc protection, limiting power output in case of abnormal load, protecting the supporting RF power supply

3. Metal shielded chassis, resistant to strong electromagnetic interference, and stable long-term continuous operation of semiconductor production lines

4. Equipped with status feedback communication, it can transmit real-time process data such as matching position and reflected power of traveling waves

5. Standardized RF connectors and installation structures, easy on-site replacement and disassembly, and no need to modify the original RF circuit

Product Parameters:

1. Material model: AMV-2000AMT

2. Operating frequency: 13.56MHz

3. Rated RF power: 2000W

4. Control power supply: DC24V

5. Compatible equipment: ADTEC RF power supply matched with plasma process machine

Application fields:

1. Automatic matching of RF impedance in semiconductor dry etching chamber

2. RF energy transfer control in plasma thin film deposition process

3. RF load matching for wafer plasma surface treatment

4. Impedance closed-loop regulation between RF power supply and process chamber

5. Replacement and maintenance of spare parts for ADTEC RF system matching device

This ADTEC AMV-2000AMT automatic impedance matching unit is a key component of the RF plasma circuit, responsible for real-time matching of RF power supply and cavity impedance to ensure plasma process stability. By checking the model, it can be directly replaced on the machine.

Product imag

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