AMAT 0190-43295 Automatic Matcher

AMAT 0190-43295 Automatic Matcher 

 Introduction

AMAT 0190-43295 Automatic Matcher

Product Features:

1. Automatically adjust RF impedance in real-time, quickly match cavity load changes, and reduce RF reflection power

2. Built in power protection circuit, automatically reduces power when the load is abnormal, protecting the RF power supply from damage

3. Metal sealed shell, resistant to electromagnetic interference from vacuum chambers, strong stability during long-term operation

4. Equipped with communication feedback, it can transmit real-time data such as matching status and power to the machine

5. Integrated assembly structure, easy on-site disassembly and assembly, spare parts replacement without changing the original RF circuit

Product Parameters:

1. Material model: 0190-43295

2. Operating frequency: 13.56MHz

3. Rated power: 2000W

4. Power supply voltage: 24V DC

5. Compatible machine: AMAT Centura series plasma process equipment

Application fields:

1. Automatic matching of RF impedance in semiconductor etching cavity

2. Physical vapor deposition PVD plasma energy regulation

3. Load matching control of RF power supply for thin film deposition process

4. RF signal matching of wafer dry cleaning chamber

Replacement of RF matching spare parts for 5.200mm semiconductor production line

This AMAT 0190-43295 automatic matching device is the core component of RF plasma equipment, responsible for continuously matching RF power supply and process chamber impedance to ensure plasma process stability. By checking the model, spare parts replacement can be quickly completed.

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