AE 3150861-011 RF Generator

AE 3150861-011 RF Generator 

 Introduction

Most colleagues in the semiconductor RF power supply maintenance industry are familiar with the AE 3150861-011 RF generator. This AE VHF RF power supply outputs high-frequency RF power and is used to excite plasma. It is the core power supply spare part for etching chambers.

Product Features

1. High frequency power output is stable, with small power fluctuations when the plasma load changes, ensuring the repeatability of the etching process

2. Built in multiple protection functions, high reflected power, overheating, and overcurrent will trigger shutdown protection

3. Fast power control response, supports pulse modulation, and adapts to precise high-frequency plasma processes

4. Native matching machine communication protocol, stable signal interaction, easy and convenient on-site disassembly and replacement

5. Rack mounted compact structure saves cabinet installation space and facilitates maintenance and repair

Product Specifications

1. Operating frequency: VHF band

2. Rated output power 3500W

3. Input three-phase AC200V

4. Support communication between analog and digital buses

5. Forced air cooling for heat dissipation, with built-in temperature monitoring

Application Areas

1. VHF dry etching process for semiconductor wafers

2. RF power supply for high aspect ratio etching cavity

3. Thin film plasma surface treatment process

4. High frequency power supply for plasma cleaning equipment

5. Maintenance and replacement of spare parts for AE RF generator

Overall, AE 3150861-011 RF generator has stable high-frequency output and strong pulse control capability. It is often used for replacing RF faults in VHF etching chambers.

Product imag

ontroller Module

1C31197G05 Digital input module
1C31201G01 Analog input module
1C31227G02 analog output module

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