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  • AE 27-339413-00 RF Matching Module
  • AE 27-339413-00 RF Matching Module
  • AE 27-339413-00 RF Matching Module
AE 27-339413-00 RF Matching Module AE 27-339413-00 RF Matching Module AE 27-339413-00 RF Matching Module

AE 27-339413-00 RF Matching Module

AE 27-339413-00 RF Matching Module 

 Introduction

Colleagues in semiconductor equipment maintenance are familiar with the AE 27-339413-00 RF matching module, which is used to adjust RF impedance, stabilize plasma, and reduce power reflection. It is a critical spare part for the machine.

Product Features

1. The automatic tuning response is fast, and impedance matching is quickly completed when the load changes

2. Strong anti-interference ability, stable and reliable long-term continuous operation

3. Comes with fault protection to protect the RF power supply under abnormal working conditions

4. Original standard interface, easy to disassemble and replace on site

5. The module is compact in size, making it easy to install in narrow chambers of equipment

Product Specifications

1. Operating frequency 13.56MHz

2. Rated power 2000W

3. Standard impedance 50 Ω

4. Working environment temperature: 0 ℃~50 ℃

5. Support machine communication and real-time upload of operational status data

Application Areas

1. Dry etching process for wafers

2. PVD physical vapor deposition

3. Plasma wafer surface cleaning

4. CVD chemical vapor deposition

5. Replacement and maintenance of spare parts for AE supporting semiconductor equipment

Overall, the AE 27-339413-00 RF matching module has stable performance, minimal process fluctuations, and is frequently used for production line maintenance and replacement.

Product imag

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