Introduction
AE 3152412-243 is a Pinnacle 20K RF generator, a high-power RF power supply for semiconductor plasma equipment, commonly used for replacing old machine spare parts, with reliable process stability.
5 product features:
1. High power RF output, closed-loop power control, with minimal output fluctuations under plasma conditions.
2. High speed arc detection and suppression, rapid power reduction when encountering chamber ignition, protecting process chambers and components.
3. Supports pulse modulation mode and can adapt to dynamic power adjustment of various plasma processes.
4. Digital communication and analog dual control interface, convenient for interfacing with the host system for parameter setting and status reading.
5. High power forced air cooling chassis, optimized air duct, stable heat dissipation during long-term operation at full load.
5 product parameters:
1. Rated output power of 20kW, operating frequency of 13.56MHz.
2. Three phase AC input 208-480VAC, suitable for power supply conditions in semiconductor workshops.
3. Supports analog 0-10V, 4-20mA, and digital communication control modes.
4. 4U rack mounted installation, air-cooled heat dissipation.
5. The working temperature is 0-40 ℃, suitable for continuous operation of clean equipment rooms.
5 application areas:
1. RF plasma power supply for semiconductor etching equipment.
2. PVD physical vapor deposition equipment process power supply.
3. Replacement of original spare parts for AMAT wafer processing equipment.
4. ICP inductively coupled plasma process equipment.
5. Maintenance and replacement of plasma process equipment for display panel coating.
In general, this RF power supply has been discontinued, and most of the market is for refurbished spare parts. When selecting, it is necessary to check the material code of the entire machine and confirm that it matches before putting it on the machine
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