TEL 2L81-050097-V3 RF Controller

TEL 2L81-050097-V3 RF Controller

 Introduction

TEL 2L81-050097-V3 is a dedicated RF controller for semiconductor etching equipment, with precise power regulation and stable control of plasma RF output in the cavity.

1. High precision RF power regulation with minimal output fluctuations

2. Real time impedance monitoring to reduce RF reflection loss

3. Built in electromagnetic isolation to resist complex machine interference

4. Wide temperature operation, suitable for high and low temperature conditions in clean rooms

5. Gold plated RF interface, stable long-term connection without jumping

6. Fast signal response, plasma start stop without delay

7. Equipped with fault self check and automatic alarm protection for over reflection

8. Reinforce the seismic resistance of the plate body and adapt to continuous vibration of the production line

9. Multi layer shielding structure reduces RF signal leakage

10. Standard rack plug-in, easy to disassemble and maintain

11. Multiple overcurrent, overpressure, and overheat protection, not easily burned out

12. Multi process parameter storage, one click process switching

13. Low loss circuit design, lower overall temperature rise

14. Match all TEL etching and thin film equipment electrical controls across the range

15. Original factory aging test, supporting 7 × 24-hour continuous operation

Conclusion: TEL 2L81-050097-V3 RF control is stable and reliable, and is a core control component for semiconductor plasma processes

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