Olympus U-AFA2M-VIS microscope autofocus unit

Olympus U-AFA2M-VIS microscope autofocus unit 

Product Details Introduction

Olympus U-AFA2M-VIS Microscope Autofocus Unit Product Features

Introduction: Olympus U-AFA2M-VIS is a specialized laser autofocus unit for Olympus industrial inspection microscopes, adapted to bright field detection light paths, with stable and efficient imaging focusing. Its core features are as follows:

Adopting split pupil reflective active laser focusing, accurate and stable imaging positioning

775-800nm first level safe infrared laser, no visible strong light damage to the naked eye

100Hz high-frequency pulse focusing, real-time continuous tracking of the moving stage

Multi point laser projection design, the sample surface is uneven and not easily defocused

Fast single focus response speed, significantly reducing detection waiting time

The laser spot is small, and small wafers and local circuits can be focused on

Compatible with multiple Olympus MX and BX series inspection microscope bodies

Compatible with DIC differential interference and multiple observation optical paths in both bright and dark fields

Paired with dedicated controller and supporting software, parameter visualization adjustment

Low power laser module, working continuously for a long time without generating heat easily

Built in signal filtering, focusing does not drift under workshop electromagnetic interference

Standard modular mount, disassembly and replacement without adjusting the optical path

Supports switching between single focus and continuous tracking modes

All metal precision optical cavity, dust-proof and suitable for dust-free workshop environment

Adequate focusing height range, suitable for samples of different thicknesses to be tested

Conclusion: OLYMPUS U-AFA2M-VIS has high focusing accuracy and strong compatibility, and is a core component for automated microscopic inspection of semiconductor and electronic components.

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