Product Details Introduction
The DAIHEN NGA-50A-V RF generator is compatible with TEL semiconductor etching and thin film deposition equipment, and is used for power supply in wafer plasma processes.
Rated 5kW RF power, 60MHz standard output frequency, stable process output
High precision power closed-loop control, small output fluctuations, ensuring consistency of coating process
Equipped with automatic impedance matching, it can quickly adapt to changes in cavity load and reduce arcing faults
Multiple circuit protection, automatic shutdown protection for overvoltage, overcurrent, overheating, and standing wave exceeding standards
The digital panel displays real-time power, standing wave, and fault codes, providing intuitive troubleshooting
Standard RS232 and Ethernet communication, can be connected to upper computer and semiconductor machine MES system
Air cooled cooling structure, dust-proof sealed chassis, suitable for dust-free clean workshop working conditions
Support continuous/pulse dual-mode output, flexibly matching different etching and sputtering processes
Three phase 200V industrial power supply, compatible with semiconductor factory standard power supply specifications
Modular power cavity, faulty components can be disassembled and replaced separately, easy maintenance
Low harmonic RF output, resistant to electromagnetic interference from workshop frequency converters, strong operational stability
Original factory standardized interface, can be used in conjunction with DAIHEN RF matching devices of the same series
Compact cabinet structure, easy to integrate into the control cabinet of vacuum process equipment
Designed for long-term full load operation, it can work continuously with mass production lines around the clock
Japanese original components with high durability, are the original matching power supply for TEL equipment
The DAIHEN NGA-50A-V process has high adaptability and low failure rate, making it the mainstream RF power supply component in semiconductor wafer manufacturing.
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