LAM 839-019090-620 electrostatic clamp
Product Details Introduction
839-019090-620 is an electrostatic chuck (ESC) produced by LAM Research, mainly used for clamping and fixing silicon wafers in the semiconductor manufacturing process.
Main features:
High precision clamping: By precisely fixing the silicon wafer with electrostatic force, the stability and positional accuracy of the silicon wafer are ensured during the processing.
Widely applicable: Suitable for semiconductor manufacturing processes such as chemical vapor deposition (CVD), physical vapor deposition (PVD), etching, etc.
High reliability: designed to meet the high requirements of semiconductor manufacturing environments, with excellent durability and stability.
Application areas:
This electrostatic clamp is widely used in the semiconductor manufacturing industry, especially in the following processes:
Chemical Vapor Deposition (CVD): Used for depositing thin films on the surface of silicon wafers.
Physical Vapor Deposition (PVD): Used for depositing metals or other materials on the surface of silicon wafers.
Etching: Used for etching patterns on silicon wafers.
Maintenance and replacement:
Long term use may lead to a decrease in the performance of the electrostatic clamp. Regular inspection and replacement of this module can ensure the stability and efficient operation of the semiconductor manufacturing process.
Product imag

Related website links
ABB SB822 3BSE018172R1 rechargeable
CI860K01 3BSE032444R1 power module
CI871AK01 3BSE092693R1 interface module
Other website links
ABB PL810P 3BDH000311R0101 电源链接模块
| 6ES5434-7LA12 | 6SC9711-0AL0 | 6ES5318-8MB11 |
| 6ES5432-7LA11 | CACR-PR01KA4BU | 6DD2920-0XG02 |
| 6ES5431-8MD11 | 6SC6030-2AA02 | 6ES5314-3UA11 |
| 6ES5-431-8MC11 | 6SC9711-0AB0 | 1BF41-0BC0 |
| 6ES5431-8FA11 | CACR-IR151515F | 6DD2920-0XD01 |
| 6ES5430-8MD11 | CACR-HR03BBY75 | 6DD2920-0XC03 |
| 6ES5430-8MB11 | 6SC9830-0AB20 | 6ES5312-5AA31 |
| 6ES5430-4UA13 | CACR-SR-44BB1AF | 6DD2920-0XC02 |