TEL Tokyo Electron MB3M36-050151-11 Vacuum Gauge
Product Details Introduction
The Tokyo Electron 3D80-000710-V3 cooling unit is a critical thermal management unit used in semiconductor manufacturing equipment. Its main function is to effectively control and dissipate the heat generated inside the equipment, ensuring the stability and performance of the system under high-precision and high load operation. The following is a detailed analysis of its product application areas:
1、 Main application areas
Semiconductor Etching Systems
The cooling machine component is used to control the temperature of the reaction chamber and prevent overheating during plasma processing.
Ensure the temperature control accuracy of process gas reaction and improve the consistency of etching patterns.
Chemical vapor deposition systems (CVD, PECVD, SACVD, etc.)
During the thin film deposition process, key subsystems such as the cooling reaction chamber, substrate transfer system, and vacuum pump are cooled.
Control heat load to improve film thickness uniformity and film quality.
Lithography Equipment
Used to cool the light source module or exposure stage substrate of the exposure system, ensuring exposure accuracy.
Maintain system thermal stability and reduce thermal drift errors during high repetition rate operations.
Wafer Transfer&Alignment Systems
Provide cooling for motor driven components or conveying robotic arms to extend equipment lifespan.
Maintain a constant temperature to improve wafer alignment accuracy and mechanical response speed.
Vacuum pump and cooling circulation system
Coupled with the process pump system, serving as an auxiliary thermal management unit during process operation.
Control the temperature inside the vacuum chamber to improve the efficiency of the pumping system.
Product imag

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