RFPT URG-300 PR000300-001 RF Generator

RFPT URG-300 PR000300-001 RF Generator

Product Introduction

RFPT URG-300 PR000300-001 RF Generator

Product Features

Stable output RF power waveform with clean harmonic suppression effect

Built in standing wave protection, overheating protection, overload protection, multiple safety protections

Support continuous and pulse output modes to adapt to multiple plasma processes

Metal sealed chambers are suitable for use with vacuum equipment due to their resistance to electromagnetic interference

Modular integrated structure facilitates installation, replacement, and maintenance inside the cabinet

Product application areas

Semiconductor plasma cleaning equipment

RF source unit for wafer etching process

Thin film deposition PVD CVD process equipment

Wafer debonding and ashing processing system

Laboratory Plasma Research Platform

Optical coating vacuum coating equipment

Material surface modification treatment device

MEMS device processing equipment

Vacuum testing RF excitation unit

Precision electronic manufacturing plasma equipment

Product Specifications

Rated output power of 300 watts

Operating frequency 13.56 MHz

Communication interface analog signal and RS485 communication

The RFPT URG-300 PR000300-001 RF generator provides stable RF energy for vacuum plasma processes, ensuring stable operation of plasma excitation and process processing in various semiconductor processes.

Product imag

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